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UID:siggraph_SIGGRAPH 2026_sess117_papers_185@linklings.com
SUMMARY:PatternGSL: A Structured Specification Language for Template-Free 
 and Simulation-Ready 3D Garments
DESCRIPTION:Zhenyang Li (The University of Hong Kong (HKU); Tsinghua Unive
 rsity, China); Lutao Jiang (The Hong Kong University of Science and Techno
 logy (Guangzhou)); Yizhou Zhao (Carnegie Mellon University); Weikai Chen (
 LIGHTSPEED); Ying-Cong Chen (The Hong Kong University of Science and Techn
 ology (Guangzhou), The Hong Kong University of Science and Technology); Xi
 n Wang (LIGHTSPEED); and Yifan Peng (The University of Hong Kong (HKU))\n\
 nWe present PatternGSL, a structured and template-free representation for 
 simulation-ready 3D garments. Given a single garment image, our VLM-based 
 method predicts editable sewing patterns with explicit panel, edge, and st
 itch topology. Trained on the large-scale PatternGSLData dataset, it enabl
 es accurate reconstruction, cloth simulation, and downstream garment desig
 n workflows.\n\nInterest Area: Research & Education\n\nKeyword: Animation,
  Artificial Intelligence/Machine Learning, Geometry, Modeling, Simulation\
 n\nRegistration Category: Full Conference Supporter, Full Conference\n\nSe
 ssion Chair: Biao Zhang (Xi'an Jiaotong University)\n\n
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